MSE303
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MSE303 - DC and RF Plasma Engineering for Engineering
Course ID
036711
Course Description
Fundamental concepts and techniques of fluid mechanics, electromagnetism, and thermodynamics required to understand the environment of non-thermal, low-temperature, and equilibrium plasmas used in semiconductor manufacturing. Plasma chemistry and surface processes that occur during both plasma depostition and etching.
Min Units
3
Max Units
3
Repeatable for Credit
No
Grading Basis
GRD - Regular Grades A, B, C, D, E
Career
Undergraduate
Course Requisites
Participant in an approved UA DL partnership with Intel Corporation.
May be convened with
Component
Lecture
Optional Component
No