MSE401
Download as PDF
MSE401 - Industrial Thin Film Deposition
Course ID
043899
Course Description
This course will introduce the industrial use of physical vapor deposition, etching, surface modification, and plasma enhanced chemical vapor deposition (PECVD) processes for thin film deposition. A comprehensive review of thin film deposition hardware operating concepts and process requirements, thin film materials, substrate preparation, and thin film material characterization. Magnetically confined sputtering, thermal evaporation, cathodic arc deposition, ion beam sputtering, and PECVD are reviewed and compared to show the deposition process and control variables, deposited thin film material properties, and industrial applications for each process.
Min Units
3
Max Units
3
Repeatable for Credit
No
Grading Basis
GRD - Regular Grades A, B, C, D, E
Career
Undergraduate
Enrollment Requirements
015063
Course Requisites
PHYS 241
May be convened with
MSE501
Component
Lecture
Optional Component
No